2003, ISBN: 140207543X
[EAN: 9781402075438], Neubuch, [SC: 0.0], [PU: Springer US], ADHESION; COATING; DIFFUSION; FILM; METALS; OPTICALPROPERTIES; STRUCTURE; SURFACE, Druck auf Anfrage Neuware -Diffusion Barrie… More...
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2003, ISBN: 9781402075438
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2003, ISBN: 9781402075438
Principles and Applications, Buch, Hardcover, 2003 ed. [PU: Springer-Verlag New York Inc.], Springer-Verlag New York Inc., 2003
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2003, ISBN: 140207543X
[EAN: 9781402075438], Neubuch, [SC: 0.0], [PU: Springer US], ADHESION; COATING; DIFFUSION; FILM; METALS; OPTICALPROPERTIES; STRUCTURE; SURFACE, Druck auf Anfrage Neuware -Diffusion Barrie… More...
2003, ISBN: 9781402075438
[ED: Hardcover], [PU: Springer, Berlin], Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topograph… More...
ISBN: 9781402075438
Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topography that is encountered in the processing o… More...
ISBN: 9781402075438
Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topography that is encountered in the processing o… More...
2003, ISBN: 9781402075438
Principles and Applications, Buch, Hardcover, 2003 ed. [PU: Springer-Verlag New York Inc.], Springer-Verlag New York Inc., 2003
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Details of the book - Pulsed and Pulsed Bias Sputtering
EAN (ISBN-13): 9781402075438
ISBN (ISBN-10): 140207543X
Hardcover
Publishing year: 2003
Publisher: Springer-Verlag New York Inc.
180 Pages
Weight: 0,438 kg
Language: eng/Englisch
Book in our database since 2007-05-16T02:18:56+01:00 (London)
Detail page last modified on 2023-11-27T16:29:44+00:00 (London)
ISBN/EAN: 140207543X
ISBN - alternate spelling:
1-4020-7543-X, 978-1-4020-7543-8
Alternate spelling and related search-keywords:
Book author: ming
Book title: pulsed, sputter, sputtering
Information from Publisher
Author: Edward V. Barnat; Toh-Ming Lu
Title: Pulsed and Pulsed Bias Sputtering - Principles and Applications
Publisher: Springer; Springer US
157 Pages
Publishing year: 2003-09-30
New York; NY; US
Language: English
106,99 € (DE)
109,99 € (AT)
118,00 CHF (CH)
Available
XI, 157 p. 27 illus.
BB; Hardcover, Softcover / Technik/Maschinenbau, Fertigungstechnik; Technische Anwendung von elektronischen, magnetischen, optischen Materialien; Verstehen; adhesion; coating; Diffusion; film; metals; optical properties; structure; surface; Optical Materials; Surfaces, Interfaces and Thin Film; Physical Chemistry; Polymers; Materialwissenschaft; Physikalische Chemie; Technische Anwendung von Polymeren und Verbundwerkstoffen; EA; BC
1 Introduction.- 2 Basic Plasma Phenomenon.- 3 Plasma Sources Used for Sputter Deposition.- 4 Response of a Plasma to an Applied Bias.- 5 Sinusoidal Waveform.- 6 Pulsed Waveform.- 7 Application Of A Pulsed Waveform to a Target: Pulsed Reactive Sputtering.- 8 Application of a Pulsed Waveform to a Substrate: Pulsed Bias Sputtering.- 9 Conclusions and Future Directions.- References.More/other books that might be very similar to this book
Latest similar book:
9781461504115 Pulsed and Pulsed Bias Sputtering (Edward V. Barnat/ Toh-Ming Lu)
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