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Pulsed and Pulsed Bias Sputtering: Principles and Applications - Edward V. Barnat
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Edward V. Barnat:

Pulsed and Pulsed Bias Sputtering: Principles and Applications - new book

ISBN: 9781402075438

Pulsed and pulsed bias sputter deposition are advanced thin deposition techniques that allow one to produce high quality metal and insulating films. In the pulsed sputtering case, the tec… More...

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Pulsed and Pulsed Bias Sputtering - Barnat, Edward V. Lu, Toh-Ming
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Barnat, Edward V. Lu, Toh-Ming:

Pulsed and Pulsed Bias Sputtering - hardcover

2003, ISBN: 9781402075438

[ED: Hardcover], [PU: Springer, Berlin], Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topograph… More...

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Pulsed and Pulsed Bias Sputtering - Edward V. Barnat; Toh-Ming Lu
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Edward V. Barnat; Toh-Ming Lu:
Pulsed and Pulsed Bias Sputtering - hardcover

ISBN: 9781402075438

Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topography that is encountered in the processing o… More...

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Pulsed and Pulsed Bias Sputtering - Edward V. Barnat; Toh-Ming Lu
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Edward V. Barnat; Toh-Ming Lu:
Pulsed and Pulsed Bias Sputtering - new book

ISBN: 9781402075438

Materials Science; Optical and Electronic Materials; Surfaces and Interfaces, Thin Films; Physical Chemistry; Polymer Sciences adhesion, coating, Diffusion, film, metals, optical properti… More...

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Pulsed and Pulsed Bias Sputtering - Edward V. Barnat; Toh-Ming Lu
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€ 181.89
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Edward V. Barnat; Toh-Ming Lu:
Pulsed and Pulsed Bias Sputtering - new book

ISBN: 9781402075438

Materials Science; Optical and Electronic Materials; Surfaces and Interfaces, Thin Films; Physical Chemistry; Polymer Sciences adhesion, coating, Diffusion, film, metals, optical properti… More...

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Details of the book
Pulsed and Pulsed Bias Sputtering

This book provides basic knowledge on the design of the instrumentation for pulsed and pulsed bias sputtering techniques as well as the knowledge for the control of thin film properties using the deposition parameters such as pulsing cycle and duty.The book focuses on the basic principles and experimentation of the pulsed and pulsed bias sputter deposition of thin films. The transient charging characteristics of the target in the DC reactive sputtering of insulator films and of the insulating substrate in the DC sputtering of metal films without the pulsing are discussed in detail. The predictions and experimentation of the discharging (neutralization) strategies using pulsing potentials are presented. Examples are given on the growth of thin films using these strategies and on the relationship between the film properties the pulsing parameters. In addition, the book also presents in a coherent manner the basic physics of DC plasma formation and the utilization of the plasma in the sputtering environment. The book will not only be useful for academic researchers but also for industrial scientists interested in sputter coating of high quality metal and insulating films.

Details of the book - Pulsed and Pulsed Bias Sputtering


EAN (ISBN-13): 9781402075438
ISBN (ISBN-10): 140207543X
Hardcover
Publishing year: 2003
Publisher: Springer-Verlag GmbH
180 Pages
Weight: 0,438 kg
Language: eng/Englisch

Book in our database since 2007-05-16T02:18:56+01:00 (London)
Detail page last modified on 2020-07-06T18:17:37+01:00 (London)
ISBN/EAN: 140207543X

ISBN - alternate spelling:
1-4020-7543-X, 978-1-4020-7543-8


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