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INVESTIGATIONS ON MAGNETRON SPUTTERED TANTALUM OXIDE FILMS - S. V. Jagadeesh Chandra|S Uthanna|G Mohan Rao
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S. V. Jagadeesh Chandra|S Uthanna|G Mohan Rao:

INVESTIGATIONS ON MAGNETRON SPUTTERED TANTALUM OXIDE FILMS - Paperback

2011, ISBN: 3843394229

[EAN: 9783843394222], Neubuch, [PU: LAP LAMBERT Academic Publishing], PHYSIK ASTRONOMIE REACTIVE MAGNETRON SPUTTERING THIN FILMS TANTALUM OXIDE STRUCTURE STOICHIOMETRY ELECTRICAL AND OPTI… More...

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INVESTIGATIONS ON MAGNETRON SPUTTERED TANTALUM OXIDE FILMS - S. V. Jagadeesh Chandra S Uthanna G Mohan Rao
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S. V. Jagadeesh Chandra S Uthanna G Mohan Rao:

INVESTIGATIONS ON MAGNETRON SPUTTERED TANTALUM OXIDE FILMS - First edition

2011, ISBN: 9783843394222

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INVESTIGATIONS ON MAGNETRON SPUTTERED TANTALUM OXIDE FILMS: Microelectronic device applications - Jagadeesh Chandra, S. V. Uthanna, S, Mohan Rao, G
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Jagadeesh Chandra, S. V. Uthanna, S, Mohan Rao, G:
INVESTIGATIONS ON MAGNETRON SPUTTERED TANTALUM OXIDE FILMS: Microelectronic device applications - Paperback

2011

ISBN: 9783843394222

LAP LAMBERT Academic Publishing, Taschenbuch, 188 Seiten, Publiziert: 2011-01-18T00:00:01Z, Produktgruppe: Buch, 0.63 kg, Astronomie, Naturwissenschaften & Technik, Kategorien, Bücher, In… More...

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S V Jagadeesh Chandra:
Investigations on Magnetron Sputtered Tantalum Oxide Films Microelectronic Device Applications - Paperback

2001, ISBN: 9783843394222

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Investigations on Magnetron Sputtered Tantalum Oxide Films - S. V. Jagadeesh Chandra
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S. V. Jagadeesh Chandra:
Investigations on Magnetron Sputtered Tantalum Oxide Films - Paperback

2011, ISBN: 3843394229

[EAN: 9783843394222], Neubuch, [PU: LAP Lambert Academic Publishing], PRINT ON DEMAND Book; New; Fast Shipping from the UK., Books

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INVESTIGATIONS ON MAGNETRON SPUTTERED TANTALUM OXIDE FILMS: Microelectronic device applications
Author:
Title:
ISBN:

3843394229


High permittivity dielectrics are studied intensively in the view of their use in the integrated circuits. However, the real emergence of tantalum oxide (Ta2O5) as a dielectric material happened due to its high-dielectric constant, chemical and thermal stability with the promise of compatibility in microelectronic processing. This book covenants with the optimized deposition conditions of Ta2O5 films formed on quartz and p-type Si substrates using dc and rf reactive magnetron sputtering method for structural and optical studies. Further, aluminum metal deposited as a top electrode on Ta2O5 and Si stack to prepare metal oxide semiconductor device for investigating electrical and dielectric properties. The possible ways for depositing good quality Ta2O5 layers on Si, to obtain high dielectric constant explained in this book are quite useful to prepare high quality metal oxide semiconductor device for capacitor applications.

Details of the book - INVESTIGATIONS ON MAGNETRON SPUTTERED TANTALUM OXIDE FILMS: Microelectronic device applications


EAN (ISBN-13): 9783843394222
ISBN (ISBN-10): 3843394229
Hardcover
Paperback
Publishing year: 2011
Publisher: LAP LAMBERT Academic Publishing

Book in our database since 2009-08-09T08:58:23+01:00 (London)
Detail page last modified on 2023-07-16T06:15:43+01:00 (London)
ISBN/EAN: 3843394229

ISBN - alternate spelling:
3-8433-9422-9, 978-3-8433-9422-2
Alternate spelling and related search-keywords:
Book author: mohan
Book title: magnetron, tantalum

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